ENHANCED EMIR FLOW DEVELOPMENT FOR ADVANCED TECHNOLOGY NODES

Abstract

Electromigration and IR drop effects have been a reliability concern in IC design. Electromigration damages in interconnects is a well-known bottleneck of integrated circuits, as it is responsible for performance degradation, affecting parameters like delay, power and frequency. EMIR analysis is performed on two advanced technologies, BiCMOS technology and 3D Integrated technology. Main features of these technologies are discussed for better understanding. Testcases are made for EMIR analysis on these technologies. Schematic and testbench of testcases are made using Cadence Virtuoso. Simulations for EMIR are done on the layout of the testcase. EMIR analysis has been performed using three EDA tools, Synopsys Customsim-RA, Cadence VoltusFi and Ansys Totem. Concise EMIR results are presented for Cadence VoltusFi. Development of EMIR flow is done using QA Machine. Testcases for both the technologies are uploaded on QA Machine for automated testing of the EMIR flow. QA Machine test report is also presented.