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dc.contributor.authorAHMAD, IRFAN-
dc.date.accessioned2017-09-13T11:16:05Z-
dc.date.available2017-09-13T11:16:05Z-
dc.date.issued2017-07-
dc.identifier.urihttp://dspace.dtu.ac.in:8080/jspui/handle/repository/15963-
dc.description.abstractA theoretical modelling for the catalyst-assisted growth of graphene sheet in the presence of plasma (Ar + H2 + C2H2) has been investigated. It is observed that the plasma composition can strongly affect the growth and field emission properties of graphene sheet. The effect of plasma compositions (i.e., different concentration of participating ions) on growth, structure and field emission properties Graphene sheet has been theoretically investigated. In plasma, two different kinds of positively charged ions with heavy (Acetylene, C2H2+) to light (Hydrogen, H+ ) ion, with neutral mass ratio of 13 are considered and the effect of the different fractional concentrations of participating ions on the growth and field emission properties of graphene is studied. Numerical calculations of the graphene sheet dimensions (height, thickness) for different fractional light ion concentrations have been carried out for the graphene growth via PECVD. It is found that on increasing fractional light ion concentration, the thickness and height of graphene sheet decreases and consequently the field emission factor for graphene sheet increases.en_US
dc.language.isoenen_US
dc.relation.ispartofseriesTD-2938;-
dc.subjectGRAPHENE GROWTHen_US
dc.subjectHEAVY IONSen_US
dc.subjectLIGHTen_US
dc.subjectVIA PECVD TECHNIQUEen_US
dc.titleROLE OF LIGHT AND HEAVY IONS ON GRAPHENE GROWTH VIA PECVD TECHNIQUEen_US
dc.typeThesisen_US
Appears in Collections:M.E./M.Tech. Applied Physics

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